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Microbeam analysis — Scanning electron microscopy — Qualification of the scanning electron microscope for quantitative measurements
60.60 Standard published
Microbeam analysis — Scanning electron microscopy — Methods of evaluating image sharpness
60.60 Standard published
Electronic projection - Measurement and documentation of key performance criteria - Part 1: Fixed resolution projectors
60.60 Standard published
Electronic projection - Measurement and documentation of key performance criteria - Part 2: Variable resolution projectors
60.60 Standard published
Microbeam analysis — Analytical electron microscopy — Vocabulary
60.60 Standard published
Microbeam analysis — Scanning electron microscopy — Guidelines for calibrating image magnification
60.60 Standard published
Microbeam analysis — Scanning electron microscopy — Guidelines for calibrating image magnification
60.60 Standard published
Microbeam analysis — Analytical electron microscopy — Method for the determination of interface position in the cross-sectional image of the layered materials
60.60 Standard published
Microbeam analysis — Scanning electron microscopy — Method for evaluating critical dimensions by CD-SEM
60.60 Standard published
Microbeam analysis — Scanning electron microscopy — Vocabulary
60.60 Standard published
Microbeam analysis — Analytical electron microscopy — Methods for calibrating image magnification by using reference materials with periodic structures
60.60 Standard published
Optics and photonics — Guidance for the selection of environmental tests
90.92 Standard to be revised
Optics and photonics — Preparation of drawings for optical elements and systems — Part 1: General
60.60 Standard published
Optics and photonics — Preparation of drawings for optical elements and systems — Part 11: Non-toleranced data
90.60 Close of review
Optics and photonics — Preparation of drawings for optical elements and systems — Part 12: Aspheric surfaces
60.60 Standard published
Optics and photonics — Preparation of drawings for optical elements and systems — Part 14: Wavefront deformation tolerance
60.60 Standard published
Optics and photonics — Preparation of drawings for optical elements and systems — Part 17: Laser irradiation damage threshold
90.93 Standard confirmed
Optics and photonics — Preparation of drawings for optical elements and systems — Part 18: Stress birefringence, bubbles and inclusions, homogeneity, and striae
60.60 Standard published
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