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SSH ISO 21466:2019

Microbeam analysis — Scanning electron microscopy — Method for evaluating critical dimensions by CD-SEM

Oct 30, 2023

General information

60.60     Oct 31, 2023

95.99   

DPS

DPS/KT 302

International Standard

37.020  

English  

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Scope

This document specifies the structure model with related parameters, file format and fitting procedure for characterizing critical dimension (CD) values for wafer and photomask by imaging with a critical dimension scanning electron microscope (CD-SEM) by the model-based library (MBL) method. The method is applicable to linewidth determination for specimen, such as, gate on wafer, photomask, single isolated or dense line feature pattern down to size of 10 nm.

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PUBLISHED
SSH ISO 21466:2019
60.60 Standard published
Oct 31, 2023

Related project

Adopted from ISO 21466:2019