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Drejtoria e Përgjithshme e Standardizimit
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ISO 21466:2019

Microbeam analysis — Scanning electron microscopy — Method for evaluating critical dimensions by CD-SEM

Dec 13, 2019

General information

60.60     Dec 13, 2019

ISO

ISO/TC 202/SC 4

International Standard

37.020  

English  

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Scope

This document specifies the structure model with related parameters, file format and fitting procedure for characterizing critical dimension (CD) values for wafer and photomask by imaging with a critical dimension scanning electron microscope (CD-SEM) by the model-based library (MBL) method. The method is applicable to linewidth determination for specimen, such as, gate on wafer, photomask, single isolated or dense line feature pattern down to size of 10 nm.

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PUBLISHED
ISO 21466:2019
60.60 Standard published
Dec 13, 2019

National adoptions

SSH ISO 21466:2019  
DPS

Microbeam analysis — Scanning electron microscopy — Method for evaluating critical dimensions by CD-SEM

60.60 Standard published

DPS/KT 302 more

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