ISO 21466:2019

Microbeam analysis — Scanning electron microscopy — Method for evaluating critical dimensions by CD-SEM

Publication date: 13 dhj 2019

General information

Current stage: 60.60 Effective date: 13 dhj 2019

Originator: ISO

Owner: ISO/TC 202/SC 4

Type: International Standard

ICS: 37.020

Gjuha: anglisht

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Statusi: Publikuar

PDF - 19 561 Lekë

Paper - 19 561 Lekë

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Scope

This document specifies the structure model with related parameters, file format and fitting procedure for characterizing critical dimension (CD) values for wafer and photomask by imaging with a critical dimension scanning electron microscope (CD-SEM) by the model-based library (MBL) method. The method is applicable to linewidth determination for specimen, such as, gate on wafer, photomask, single isolated or dense line feature pattern down to size of 10 nm.

Life cycle

NOW

PUBLISHED
ISO 21466:2019
60.60 Standard published
13 dhj 2019

National adoptions

SSH ISO 21466:2019

DPS

Analiza e mikrorrezes - Mikroskopi elektronik skanues - Metoda për vlerësimin e dimensioneve kritike nga CD-SEM

60.60 Standard published

DPS/KT 302 më tepër

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