ISO/WD 19383

Atomic Layer Deposition-- Chemical characteristics and related process specifications of atomic layer deposition precursors

General information

Current stage: 20.60 Effective date: 7 gush 2024

Originator: ISO

Owner: ISO/TC 107

Type: International Standard

Scope

This document describes the chemical characteristics and related process specifications of the atomic layer deposition precursors, including assay content, metal purity, and anion content specification.

Life cycle

NOW

IN_DEVELOPMENT
ISO/WD 19383
20.60 Close of comment period
7 gush 2024

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