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ISO/FDIS 19383

Atomic layer deposition — Chemical characteristics and related process specifications of atomic layer deposition precursors

General information

50.20     Feb 11, 2026

ISO

ISO/TC 107

International Standard

25.220.01  

Scope

This document describes the chemical characteristics and related process specifications of the atomic layer deposition precursors, including assay content, metal purity, and anion content specification.

Life cycle

NOW

IN_DEVELOPMENT
ISO/FDIS 19383
50.20 Proof sent to secretariat or FDIS ballot initiated: 8 weeks
Feb 11, 2026

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