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ISO/WD 19383

Atomic Layer Deposition-- Chemical characteristics and related process specifications of atomic layer deposition precursors

General information

20.60     Aug 7, 2024

ISO

ISO/TC 107

International Standard

Scope

This document describes the chemical characteristics and related process specifications of the atomic layer deposition precursors, including assay content, metal purity, and anion content specification.

Life cycle

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IN_DEVELOPMENT
ISO/WD 19383
20.60 Close of comment period
Aug 7, 2024

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