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ISO 21859:2019

Fine ceramics (advanced ceramics, advanced technical ceramics) — Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment

Jun 18, 2019

General information

90.93     Oct 4, 2024

ISO

ISO/TC 206

International Standard

81.060.30  

English  

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Scope

This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.

Life cycle

NOW

PUBLISHED
ISO 21859:2019
90.93 Standard confirmed
Oct 4, 2024