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IEC 62047-4:2008 ED1

Semiconductor devices - Micro-electromechanical devices - Part 4: Generic specification for MEMS
21 gush 2008

General information

60.60     21 gush 2008

IEC

TC 47/SC 47F

International Standard

31.080.99  

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Scope

IEC 62047-4:2008 describes the generic specifications for micro-electromechanical systems (MEMS) made by semiconductors, which are the basis for specifications given in other parts of this series for various types of MEMS applications such as sensors, RF MEMS, excluding optical MEMS, bio MEMS, micro TAS, and power MEMS. This standard specifies general procedures for quality assessment to be used in IECQ-CECC systems and establishes general principles for describing and testing of electrical, optical, mechanical and environmental characteristics. IEC 62047-4:2008 aids in the preparation of standards that define devices and systems made by micromachining technology, including but not limited to, material characterization and handling, assembly and testing, process control and measuring methods. MEMS described in this standard are basically made of semiconductor material. However, the statements made in this standard are also applicable to MEMS using materials other than semiconductor, for example, polymers, glass, metals and ceramic materials.

Life cycle

NOW

PUBLISHED
IEC 62047-4:2008 ED1
60.60 Standard published
21 gush 2008

REVISED BY

IN_DEVELOPMENT
IEC 62047-4 ED2