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IEC 62047-29:2017 ED1

Semiconductor devices - Micro-electromechanical devices - Part 29: Electromechanical relaxation test method for freestanding conductive thin-films under room temperature

Nov 22, 2017

General information

60.60     Nov 22, 2017

IEC

TC 47/SC 47F

International Standard

31.080.99  

English  

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Scope

IEC 62047-29:2017(E) specifies a relaxation test method for measuring electromechanical properties of freestanding conductive thin films for micro-electromechanical systems (MEMS) under controlled strain and room temperature. Freestanding thin films of conductive materials are extensively utilized in MEMS, opto-electronics, and flexible/wearable electronics products. Freestanding thin films in the products experience external and internal stresses which could be relaxed even under room temperature during a period of operation, and this relaxation leads to time-dependent variation of electrical performances of the products. This test method is valid for isotropic, homogeneous, and linearly viscoelastic materials.

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PUBLISHED
IEC 62047-29:2017 ED1
60.60 Standard published
Nov 22, 2017

National adoptions

Semiconductor devices - Micro-electromechanical devices - Part 29: Electromechanical relaxation test method for freestanding conductive thin-films under room temperature

60.60 Standard published

DPS/KT 7 more