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SSH EN 62047-6:2010

Semiconductor devices - Micro-electromechanical devices - Part 6: Axial fatigue testing methods of thin film materials

Nov 30, 2010

General information

60.60     Jan 1, 2010

DPS

DPS/KT 7

European Norm

31.080.99  

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Scope

IEC 62047-6:2009 specifies the method for axial tensile-tensile force fatigue testing of thin film materials with a length and width under 1 mm and a thickness in the range between 0,1 µm and 10 µm under constant force range or constant displacement range. Thin films are used as main structural materials for MEMS and micromachines. The main structural materials for MEMS, micromachines, etc., have special features, such as typical dimensions of a few microns, material fabrication by deposition, andtest piece fabrication by means of non-mechanical machining, including photolithography. This International Standard specifies the axial force fatigue testing methods for micro-sized smooth specimens, which enables a guarantee of accuracy corresponding to the special features. The tests are carried out at room temperatures, in air, with loading applied to the test piece along the longitudinal axis.

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PUBLISHED
SSH EN 62047-6:2010
60.60 Standard published
Jan 1, 2010

Related project

Adopted from EN 62047-6:2010

Adopted from IEC 62047-6 Ed. 1.0 b