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ISO 25164

Physical vapor deposition coatings — Magnetron sputtering deposition of TiAlSiN thin films — Specification

General information

Current stage: 60.00 Effective date: Jul 1, 2026

Originator: ISO

Owner: ISO/TC 107/SC 9

Type: International Standard

ICS: 25.220.40

Scope

This document specifies the technical requirements for TiAlSiN thin films deposited by magnetron sputtering.
This document is also applicable to the deposition of TiN, TiAlN or TiSiN thin films.

Life cycle

NOW

IN_DEVELOPMENT
ISO 25164
60.00 Standard under publication
Jul 1, 2026