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ISO 14237:2010

Surface chemical analysis — Secondary-ion mass spectrometry — Determination of boron atomic concentration in silicon using uniformly doped materials

Jul 9, 2010

General information

90.93     Oct 5, 2021

ISO

ISO/TC 201/SC 6

International Standard

71.040.40  

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Scope

ISO 14237:2010 specifies a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron. This method is applicable to uniformly doped boron in the concentration range from 1 x 1016 atoms/cm3 to 1 x 1020 atoms/cm3.

Life cycle

PREVIOUSLY

WITHDRAWN
ISO 14237:2000

NOW

PUBLISHED
ISO 14237:2010
90.93 Standard confirmed
Oct 5, 2021